公司简介

NIL Technology ApS (NILT) specializes in nanopatterning and nanoimprint lithography. NILT has experience in meeting complex demands for research and new product development activities, and assists customers in all stages from pattern design to imprinted pattern.

The NILT team consists of highly motivated and skilled engineers striving for delivering high quality one-stop solutions.

产品列表

Microlens Array The Microlens Array Standard Stamp contains closely packed microlens structures arranged in a honeycomb geometry with three dimensional intersections between the individual lenses. Read more		Linear and Circular Engineered Diffusers The ED standard stamp series is specifically designed as a set of multi-purpose engineered diffusers for R&D work, as well as for product and process development. Read more
Wire Grid Polarizer (WGP) Wire Grid Polarizer silicon standard stamp with 50 nm or 70 nm half pitch grating. Read more		Grating The Grating Standard Stamp is a low-cost standard stamp with periodic line and pillar grating patterns and customers can choose among different variants with different specifications. Read more
Diffraction Grating The Diffraction Grating standard stamps are large area stamps in Nickel with linear gratings or with crossed gratings. The pitch of the gratings is in both cases 500 nm and the average depth of the gratings is 250 nm. Read more		Large Area Pillar The Large Area Pillar Standard Stamp is a high-quality standard stamp in Silicon with large patterned area of photonic crystal and anti-reflective structures. It has 4 areas, each 1 cm x 1 cm, with square arrays of pillars. Read more
Anti-Reflective The Anti-Reflective Standard Stamp is a large area and cost-effective functional standard stamp in Nickel with a graded index profile and with a continuously changing effective refractive index. Read more		Micro The Micro Standard Stamp is optimal for testing and process development within nanoimprint lithography and hot embossing. The stamp contains 3 different patterns at 3 different dimensions. Read more
Sub-Micro The Sub-Micro Standard Stamp is optimal for testing and process development within nanoimprint lithography and hot embossing. The stamp contains 4 different patterns at 4 different dimensions. Read more		Anti-Glare The anti-glare structures are used to control glare from displays, optical devices, but also non-optical surfaces. Disturbing reflections are suppressed, therefore the viewer easily sees the content displayed on a screen and not the reflected images of bright Windows and light sources. Read more
Micro Test This stamp is well suited for process testing within the fields of nanoimprint lithography and hot embossing. The stamp features arrays of square pillars/holes having a size of 3, 5, 10 and 20 µm. Read more